Die Magnetron Sputtering Deposition System<\/strong> is a compact, high-performance thin film deposition instrument designed for laboratory-scale research and development<\/strong> in materials science, semiconductor technology, optoelectronics, and surface engineering. This system utilizes DC\/RF magnetron sputtering<\/strong> to deposit high-purity, dense, and uniform films from metallic, ceramic, or compound targets under controlled vacuum conditions.<\/p>\n\n\n\n Ideal for fabricating metal electrodes, dielectric layers, transparent conductive oxides (TCOs), and nanostructured thin films<\/strong>, this system is widely used in OLED, OPV, perovskite solar cells, microelectronics, sensors, and functional coatings<\/strong> research.<\/p>\n\n\n\n With its small footprint, low power consumption, and intelligent control system<\/strong>, it is perfectly suited for installation in gloveboxes, fume hoods, or standard lab benches<\/strong>, making it an essential tool for academic and industrial R&D labs.<\/p>\n\n\n\n \ud83d\udccc Custom configurations available for larger chamber, multi-source setups, or integration with glovebox systems.<\/em><\/p>\n<\/blockquote>\n\n\n\n A university research team used our magnetron sputtering system to deposit indium tin oxide (ITO)<\/strong> films for transparent electrode applications in flexible solar cells<\/strong>. Results showed:<\/p>\n\n\n\n This enabled rapid prototyping of transparent conductive layers without requiring large-scale equipment.<\/p>\n\n\n\n This case demonstrates how the system supports advanced optoelectronic research<\/strong> with minimal infrastructure investment.<\/p>\n<\/blockquote>\n\n\n\n Die Magnetron Sputtering Deposition System<\/strong> offers a compact, reliable, and high-performance solution<\/strong> for thin film deposition in academic and industrial laboratories. With its dual magnetron configuration, smart control system, and flexible power options<\/strong>, it delivers excellent film quality and process consistency<\/strong> at an affordable cost.<\/p>\n\n\n\n Whether you’re developing next-generation solar cells, OLED displays, or functional coatings, this system provides the precision, flexibility, and reliability<\/strong> needed for successful R&D.<\/p>\n\n\n\n \ud83d\udcde Contact Us Today<\/strong> for a technical consultation, demo, or custom configuration.<\/p>\n\n\n\n Magnetron Sputtering Deposition System \u2013 Compact & High-Precision Thin Film Coating Solution Overview The Magnetron Sputtering Deposition System is a compact, high-performance thin film deposition instrument designed for laboratory-scale research and development in materials science, semiconductor technology, optoelectronics, and surface engineering. This system utilizes DC\/RF magnetron sputtering to deposit high-purity, dense, and uniform films from … Weiterlesen …<\/a><\/p>","protected":false},"author":1,"featured_media":48406,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[24],"tags":[],"class_list":["post-48371","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-deposition-systems"],"_links":{"self":[{"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/posts\/48371","targetHints":{"allow":["GET"]}}],"collection":[{"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/comments?post=48371"}],"version-history":[{"count":2,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/posts\/48371\/revisions"}],"predecessor-version":[{"id":48408,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/posts\/48371\/revisions\/48408"}],"wp:featuredmedia":[{"embeddable":true,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/media\/48406"}],"wp:attachment":[{"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/media?parent=48371"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/categories?post=48371"},{"taxonomy":"post_tag","embeddable":true,"href":"http:\/\/www.tubefurnacecn.com\/de\/wp-json\/wp\/v2\/tags?post=48371"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}
\n\n\n\nWesentliche Merkmale<\/h2>\n\n\n\n
\n
Small size (L60\u00d7W60\u00d7H96 cm) allows placement in confined spaces such as gloveboxes or cleanroom benches.<\/li>\n\n\n\n
Designed for energy efficiency\u2014ideal for labs with limited electrical capacity.<\/li>\n\n\n\n
Uses imported or domestically optimized components (e.g., vacuum pumps, vacuum gauges) to ensure long-term stability and minimal downtime.<\/li>\n\n\n\n
PLC + touchscreen intelligent control interface with automatic leak detection, fault alerts, and one-button vacuum shutdown<\/strong> for enhanced safety and ease of use.<\/li>\n\n\n\n
Equipped with two 2-inch DC magnetrons<\/strong> (with shutter), optionally upgradable to three sources. Supports both DC and RF power supply<\/strong>, enabling sputtering of conducting and insulating materials<\/strong>.<\/li>\n\n\n\n
Compatible with metallic (Al, Cr, Ti, Ag, Au)<\/strong>, ceramic (SiO\u2082, Al\u2082O\u2083, TiO\u2082)<\/strong>und compound (ITO, ZnO)<\/strong> targets.<\/li>\n\n\n\n
Achieves base pressure of 8\u00d710\u207b\u2075 Pa<\/strong> (equivalent to 6\u00d710\u207b\u2077 Torr) with mechanical + molecular pump configuration.<\/li>\n\n\n\n
Optional imported or domestic quartz crystal thickness monitor<\/strong> enables real-time monitoring and control of deposition rate and film thickness.<\/li>\n\n\n\n
\u03a6100 mm substrate holder with adjustable rotation speed (0\u201320 rpm)<\/strong> and temperature control up to 300\u00b0C<\/strong>, ensuring uniform coating on various substrates.<\/li>\n\n\n\n
Integrated water-cooled target and chamber shielding prevent overheating and improve sputtering efficiency.<\/li>\n\n\n\n\n
\n\n\n\nTechnische Daten<\/h2>\n\n\n\n
Parameter<\/th> Specification<\/th><\/tr><\/thead> Material der Kammer<\/strong><\/td> 1Cr18Ni9Ti stainless steel, welded structure, double sealing ring design<\/td><\/tr> Gr\u00f6\u00dfe der Kammer<\/strong><\/td> \u00d8180 mm \u00d7 300 mm<\/td><\/tr> Vacuum System<\/strong><\/td> Mechanical pump + diffusion\/molecular pump (domestic or imported optional)
\u2022 Base pressure: <8\u00d710\u207b\u2075 Pa
\u2022 Pumping speed: 24 L\/s
\u2022 Vacuum gauge: Capacitance manometer (range: 8\u00d710\u207b\u00b9\u2070 Pa)
\u2022 Valves: Electromagnetic valve + manual throttle valve<\/td><\/tr>Sputtering System<\/strong><\/td> Two 2-inch DC magnetrons (with shutter), upgradeable to three
\u2022 Water-cooled target holders
\u2022 DC pulse power (for metals)
\u2022 RF matching power (for dielectrics)
\u2022 Automatic impedance matching<\/td><\/tr>Substrate Holder<\/strong><\/td> \u03a6100 mm, height adjustable: 60\u2013120 mm, rotation speed: 0\u201320 rpm
\u2022 Heating capability: up to 300\u00b0C
\u2022 Optional bias voltage and ultrasonic cleaning function<\/td><\/tr>Thickness Monitor<\/strong><\/td> Optional quartz crystal oscillator (in-situ monitoring of deposition rate and total thickness)<\/td><\/tr> Kontrollsystem<\/strong><\/td> PLC + touch screen intelligent control system
\u2022 Automatic leak detection
\u2022 Fault diagnosis and alarm
\u2022 One-key vacuum stop<\/td><\/tr>Dimensions (L\u00d7W\u00d7H)<\/strong><\/td> 60 cm \u00d7 60 cm \u00d7 96 cm<\/td><\/tr> Power Supply<\/strong><\/td> 220V \/ 380V AC, 50Hz<\/td><\/tr> Weight<\/strong><\/td> ~85 kg<\/td><\/tr> Interface<\/strong><\/td> Pre-installed CF35 flange port for integration with other systems<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n \n
\n\n\n\nAnwendungen<\/h2>\n\n\n\n
Field<\/th> Application<\/th><\/tr><\/thead> Organic Electronics<\/strong><\/td> Electrode deposition for OLED, OPV, and OFET devices<\/td><\/tr> Photovoltaics<\/strong><\/td> Transparent conductive oxide (TCO) layer coating, back contact formation<\/td><\/tr> Semiconductors<\/strong><\/td> Metal gate deposition, interconnect layers<\/td><\/tr> Surface Engineering<\/strong><\/td> Functional coatings for sensors, MEMS, and biomedical devices<\/td><\/tr> Research & Development<\/strong><\/td> Thin film growth for material characterization, device prototyping<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n
\n\n\n\nWhy Choose Our Magnetron Sputtering System?<\/h2>\n\n\n\n
\n
\n\n\n\nCase Study: ITO Transparent Electrode Fabrication<\/h2>\n\n\n\n
\n
\n
\n\n\n\nConclusion<\/h2>\n\n\n\n
\n\n\n\n
","protected":false},"excerpt":{"rendered":"